Elettra
BL 03.2 R - VUV Photoemission
Vacuum UltraViolet Photoemission
The VUV Photoemission beamline, a joint project of ISM-CNR and Elettra - Sincrotrone Trieste, offers advanced instrumentation for Italian and International condensed matter community. The VUV is designed primarily for surface and solid state experiments by high resolution photoemission.The research activity at the VUV photoemission beamline covers a wide range of scientific topics on the physics of metal and semiconductor surfaces and interfaces. In particular the following types of experiments can be carried out:
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band mapping by high energy and angle-resolved photoemission;
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high resolution photoemission on core levels and valence band;
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photoelectron diffraction.
Beamline Energy Resolution
8 [meV] @ 65 [eV]
Beamline Energy Range
20 - 750 [eV]
Max Flux On Sample
1 * 1013 [ph/s] @ 100 [eV]
Spot Size On Sample Hor
300 - 500 [um]
Spot Size On Sample Vert
100 - 200 [um]
Angle Of Incidence Light On Sample Value
0.5 - 80 [degrees]
Photon Sources
Undulator 2.0 GeV
Type
Undulator
Available Polarization
Linear horizontal
Source Divergence Sigma
X = 0.07 [urad], Y = 0.074 [urad]
Energy Range
17 - 900 [eV]
Number Of Periods
36
Monochromators
Spherical Grating Monochromator
Energy Range
17 - 1000 [eV]
Type
Spherical Grating Monochromator with five interchangeable gratings and pre- and post-focusing optics
Resolving Power
20 * 103 [deltaE/E] @ 65 [eV]
Number Of Gratings
5
Grating Type
spherical
Endstations or Setup
Heating station chamber
Base Pressure
5 * 10-10 [mbar]
Endstation Operative
Yes
Sample
Sample Type
Crystal
Mounting Type
welding, gluing
Required Sample Size
X = 10 [mm], Y = 10 [mm], Z = 2 [mm]
Manipulator or Sample stage
Sample Environment
Pressure (min)
5 * 10-10 [mbar]
Pressure (Max)
10 * 10-6 [mbar]
Temperature
300 - 2300 [K]
Measurement chamber
Base Pressure
1 * 10-10 [mbar]
Endstation Operative
Yes
Sample
Sample Type
Crystal
Mounting Type
welding, gluing
Required Sample Size
X = 10 [mm], Y = 10 [mm], Z = 2 [mm]
Manipulator or Sample stage
Positioning Precision
X = 0.5 [mm], Y = 0.5 [mm], Z = 0.5 [mm]
Sample Environment
Pressure (min)
3 * 10-11 [mbar]
Pressure (Max)
1 * 10-9 [mbar]
Temperature
10 - 300 [K]
Sample Holders
Preparation chamber
Base Pressure
1 * 10-10 [mbar]
Endstation Operative
Yes
Sample
Sample Type
Crystal
Mounting Type
welding, gluing
Required Sample Size
X = 10 [mm], Y = 10 [mm], Z = 2 [mm]
Manipulator or Sample stage
Positioning Precision
X = 0.5 [mm], Y = 0.5 [mm], Z = 0.5 [mm]
Sample Environment
Pressure (min)
1 * 10-11 [bar]
Pressure (Max)
5 * 10-6 [bar]
Temperature
77 - 700 [K]
Sample Holders
Detectors
Scienta R-4000 WAL analyzer
Type
Electron analyser with CCD detection
Pixel Size
X = 50 [um], Y = 50 [um]
Array Size
X = 1000 [pixel], Y = 1000 [pixel]
Passive or Active (Electronics)
Active
Detection
Detected Particle
Electron
Techniques
Photoelectron emission
- Angular Resolved PES
- Photoelectron diffraction
- UPS
- XPS
Disciplines
Chemistry
- Other - Chemistry
Material Sciences
- Knowledge based multifunctional materials
- Other - Material Sciences
Address
Strada Statale 14, km 163,5, Trieste (TS), Italy
control/Data analysis
Control Software Type
- Labview, Scienta
Data Output Type
- spectra, images
Data Output Format
- Igor format, ibw, txt
Softwares For Data Analysis
- Wavemetrics Igor
Equipment That Can Be Brought By The User
sources
